纳米硅对人参生长发育的影响
作者:
作者单位:

(1.吉林农业大学新品种与开发国家地方联合工程研究中心,吉林 长春 130118;2.吉林抚松人参质量检测中心,吉林 抚松 134500)

作者简介:

张岂源(1998-),硕士研究生,研究方向为中药资源学。E-mail:1124846255@qq.com。

通讯作者:

基金项目:

基金项目:国家重点研发计划项目(2017YFC1702101);吉林省重大科技专项(20200504004YY)。


Effects of nano-silicon on the growth and development of ginseng
Author:
Affiliation:

(1.National and Local Joint Engineering Research Center for New Varieties and Development of JilinAgriculturalUniversity,Changchun Jilin130118;2.Jilin Fusong Ginseng Quality TestingCenter,Fusong Jilin134500)

Fund Project:

  • 摘要
  • |
  • 图/表
  • |
  • 访问统计
  • |
  • 参考文献
  • |
  • 相似文献
  • |
  • 引证文献
  • |
  • 资源附件
    摘要:

    以人参为试验材料,设置6 个浓度硅处理:0 g/L(CK)、0.03 g/L(T1)、0.06 g/L(T2)、0.09 g/L(T3)、0.12g/L(T4)、0.15 g/L(T5),用以探究不同硅浓度对人参生长发育的影响及变化趋势。结果表明,不同浓度施硅对人参的叶长、茎长、根长、叶宽、茎粗、根粗、生物量变化均有积极作用,施硅对促进人参生长的最佳供硅浓度为0.09 g/L。施硅对促进人参光合能力的提升有积极作用,胞间CO2 浓度在T2 处理下达到最大值,较CK 增高4.01%;气孔导度在T3 处理下达到最大值,较CK 增高100%;净光合速率在T3 处理下达到最大值,较CK 增高136.47%;蒸腾速率在T3 处理下达到最小值,较CK 降低27.54%。不同浓度施硅可以通过提高活性氧防御系统的酶活性(过氧化物酶含量)以及减轻细胞损伤程度(丙二醛含量)来增强人参根、茎、叶的整体抗性强度。不同浓度施硅可以引起人参体内硅含量的增加和持续积累,施硅增强人参硅素吸收的最优处理为0.09 g/L。以不同部位来看,追肥处理的人参硅素分布为叶> 根> 茎;以不同时期来看,绿果期结束、红果期开始时可能是人参吸硅的最佳时期。综上所述,人参最佳施硅浓度为0.09 g/L。本试验为促进人参生长发育和增强抗性提供实践基础,为农田栽培人参的施用硅浓度提供参考。

    Abstract:

    With ginseng as experimentalmaterial,6 concentrations of silicon were setup:0(CK),0.03(T1),0.06(T2),0.09(T3),0.12(T4)and 0.15g/L(T5)were used to explore the change trend of the influence of different silicon concentrations on the growth and development of ginseng. The results showed that different concentrations of silicon application had positive effects on leaflength,stemlength,rootlength,leafwidth,stemdiameter,root diameter and biomass of ginseng. The optimal concentration of silicon application for promoting ginseng growth was 0.09 g/L. Silicon application had a positive effect on the improvement of photosynthetic capacity of ginseng. Intercellular CO2 concentrationreached the maximum value under T2treatment,which was 4.01% higher than that in CK. The stomatal conductance reached the maximum value under T3treatment,which was 100% higher than that in CK. The net photosynthetic rate reached themaximum value under T3treatment,which was 136.47% higher than that in CK. The transpiration rate reached the minimumvalue under T3treatment,which was lower than that in CK by 27.54%. The overall resistanceintensity ofroot,stem and leaf of ginseng could be enhanced by increasing the enzyme activity of active oxygen defensesystem(peroxidasecontent)and reducing the degree of celldamage(malondialdehydecontent). Different concentration of silicon application increased and accumulated silicon content in ginseng. The optimal treatment of silicon application to enhance the absorption of ginseng silicon was 0.09 g/L. In terms of differentparts,the distribution of ginseng silicon in topdressing treatment was leaf> root>stem. From the perspective of differentperiods,the end of the green fruit period and the beginning of the red fruit period may be the best period for ginseng toabsorb silicon. Insummary,the optimal silicon application amount of ginseng is 0.09 g/L. This experiment provides a practical basis for promoting the growth and development of ginseng and enhancingresistance, and provides a reference for the applied silicon concentration of ginseng in farmland cultivation.

    参考文献
    相似文献
    引证文献
引用本文

张岂源,许永华,王刚,丁旭,王娜迪,代鸣涛.纳米硅对人参生长发育的影响[J].中国土壤与肥料,2024,(1):166-173.

复制
分享
文章指标
  • 点击次数:
  • 下载次数:
历史
  • 收稿日期:2022-12-18
  • 最后修改日期:
  • 录用日期:2023-06-25
  • 在线发布日期: 2024-04-09
《中国土壤与肥料》招聘启事
关闭